Publication Type:Journal Article
Source:ACS Appl Mater InterfacesACS Appl Mater Interfaces, Volume 7, Number 6, p.3456-61 (2015)
ISBN:1944-8252 (Electronic)<br/>1944-8244 (Linking)
Keywords:bulk heterojunctions, bulk metallic glass, nanoimprint lithography, organic photovoltaics, polymer patterning
<p>The use of bulk metallic glass (BMG) for the nanoimprint of high-aspect-ratio (>3) features into functional polymers is investigated. To accomplish this, the most critical aspect is the successful demolding of the imprinted polymer. By fluorosilane functionalization of the BMG surface and optimization of processing temperature, high aspect pore features down to 45 nm diameters are introduced into the surface of two organic photovoltaic systems: poly(3-hexylthiophene-2,5-diyl) (P3HT) and 1:1 mixtures of P3HT with Phenyl-C61-butyric acid methyl ester (PCBM). The crystallinity of P3HT demands higher forming temperatures and pressures that are difficult to obtain with conventional soft nanoimprint lithography molds. The ability to accommodate a wide range of processing conditions and the low cost of fabricating molds with nanometer-scale features point to the large potential of nanotextured BMGs as an economical and scalable imprint material for high-resolution applications.</p>
Singer, Jonathan P<br/>Gopinadhan, Manesh<br/>Shao, Zhen<br/>Taylor, Andre D<br/>Schroers, Jan<br/>Osuji, Chinedum O<br/>eng<br/>Letter<br/>Research Support, Non-U.S. Gov't<br/>Research Support, U.S. Gov't, Non-P.H.S.<br/>2015/02/03 06:00<br/>ACS Appl Mater Interfaces. 2015 Feb 18;7(6):3456-61. doi: 10.1021/am507368g. Epub 2015 Feb 5.